GlobalFoundries’ Remote Plasma Clean initiative cuts emissions

GlobalFoundries is taking a big step towards greener chipmaking with a breakthrough initiative at its Singapore site.

Its 200 mm fab Remote Plasma Clean project replaces traditional chamber-cleaning processes, which were among the company’s largest contributors to Scope 1 emissions in wafer fabrication, with a more environmentally efficient alternative.

By switching to an alternative reaction gas and optimising the recipe and equipment, the upgraded processes achieved a 97 per cent reduction in carbon emissions, eliminating more than 46,000 tonnes of carbon dioxide equivalent annually.

Through careful phased implementation, GlobalFoundries successfully managed the inherent risks of introducing new technology to sensitive semiconductor manufacturing processes. The successful deployment in phase one enabled the rapid roll-out of subsequent phases in other processes within the company’s 200 mm fab in Singapore.
 

“We adopted a phased, multi-year approach to implementation. A core team of cross-functional stakeholders was aligned at every stage, and we brought in additional experts – including supply chain partners – to broaden our perspective and proactively address potential challenges,” says Tan Yew Kong, senior vice-president and general manager of Asia-Pacific manufacturing and the Singapore site at GlobalFoundries.
 

The transition began with recipe-level adjustments, assessing implications for maintenance, output quality, and inventory. Each stage was stabilised before moving to high-volume production, allowing the shift to the new gas without disrupting daily operations.

The project required more than just technical adjustments. It involved a shift in mindset across the team, encouraging experimentation and continuous learning.

The team also challenged long-held assumptions and encouraged cross-functional collaboration.

“Best practice became less about using the most proven traditional method and more about finding the best method for our specific context. This openness to change and shared mission helped us overcome challenges and accelerate adoption,” Tan explains.

Beyond cutting emissions, the Remote Plasma Clean project also delivered operational benefits.

These included improved chamber hygiene and cleaning efficiency, which reduced maintenance downtime and boosted wafer throughput. These benefits enhanced overall fabrication productivity and demonstrated how sustainability and performance can go hand in hand.

The success of Giga+ Remote Plasma Clean was recognised at the Energy Efficiency National Partnership (EENP) Awards 2025, where GlobalFoundries received the Best Practices Award for its innovative approach to reducing greenhouse gas emissions.

Building on the success of the Remote Plasma Clean project, GlobalFoundries is exploring new green initiatives, including a central abatement system and smart automation, guided by the same collaborative and incremental approach.
 

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